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Introduction
 

 

PHOLOGIC project is intended to explore the mass-manufacturing compatibility of nonlinear photonic materials (CdTe and Si-nc) and their associated fabrication processes with CMOS processing lines using a highly scalable photonic logic gate structure as functional validation device.

 

 

 

 

PHOLOGIC intends to assess and optimise the path towards using CdTe and Si-nc materials in a intermediate step within a CMOS mass-manufacturing processing route. Therefore, the full optical characterisation of the proposed materials and the optimisation of their fabrication processes will suppose a radical long-term innovation beyond current state-of-the-art and a clear innovation aimed at mastering nanophotonics for low cost.

As a functional validation device an all-optical logic gate using a nonlinear Mach-Zehnder interferometer (MZI) structure will be implemented. Such a structure is highly scalable (most suitable for mass-manufacturing) and multi-functional, since the same structure can be employed to perform many key functionalities required in all-optical network nodes. Furthermore, photonic crystals as well as other periodic structures will be used to exploit the concept of slow waveguiding (due to the very low group velocity achieved) reducing thus the size and power requirements of the all-optical logic gate.